Product Name :
Tetrakis(diethylamino)titanium T9985
CAS :
4419-47-0
Description :
Tetrakis (diethylamino) titanium is useful Ti-source precursor. It is used in TiN film deposition using the atomic layer deposition method1,2. It is also used during the process of etching a layer of diamond like carbon. A novel templated non-hydrolytic sol-gel synthesis of titanosilicate xerogels is reported. Acetamide elimination from silicon acetate and titanium diethylamide allows obtaining titanosilicates with a high content of Si-O-Ti bonds but low surface areas. 1226800-12-9 uses 1631070-69-3 Chemical name Metal-organic chemical vapor deposition (MOCVD) of TiN thin films at low temperatures and low pressures using tetrakis(diethylamino) Ti (TDEAT) and NH3 is described. TDEAT dissociatively chemisorbs on SiO2 at room temperature or above.
Chemical Synonym:
TDEAT, Tetrakis(diethylamino)titanium (IV)
SKU:
Grade Quantity List Price
Appearance/Form:
Liquid
Property 1 :
Purity:
Formula :
C 16 H 40 N 4 Ti
Handling and Storage :
Precautions for safe handling Avoid contact with skin and eyes. Do not breathe dust. Do not breathe vapors or spray mist. Use only in area provided with appropriate exhaust ventilation. Use explosion-proof equipment. Use only non-sparking tools. Conditions for safe storage, including any incompatibilities Keep in a dry, cool and well-ventilated place. Keep container tightly closed. Keep away from heat and sources of ignition. Flammables area. Keep under nitrogen.
Molecular Weight:
336.4
MP:
Storage:
Keep container tightly closed in a dry and well-ventilated place.
Transport Information :
DOT (US) UN number: 2924 Class: 3, 8 Packing group: II Proper shipping name: FLAMMABLE LIQUID, CORROSIVE, N.O.S.(TETRAKIS(DIETHYLAMINO)-TITANIUM) IMDG UN number: 2924 Class: 3, 8 Packing group: II Proper shipping name: FLAMMABLE LIQUID, CORROSIVE, N.O.S.(TETRAKIS(DIETHYLAMINO)-TITANIUM) IATA UN number: 2924 Class: 3, 8 Packing group: II Proper shipping name: FLAMMABLE LIQUID, CORROSIVE, N.O.S.(TETRAKIS(DIETHYLAMINO)-TITANIUM)
Vapor Pressure :
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